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系統識別號 U0026-3008202002095600
論文名稱(中文) 應用於高溫之高熵氧化物太陽能吸收膜
論文名稱(英文) High Entropy Oxide Thin Films as High Temperature Solar Selective Absorber
校院名稱 成功大學
系所名稱(中) 材料科學及工程學系
系所名稱(英) Department of Materials Science and Engineering
學年度 108
學期 2
出版年 109
研究生(中文) 林易成
研究生(英文) Yi-Cheng Lin
學號 N56061488
學位類別 碩士
語文別 中文
論文頁數 83頁
口試委員 指導教授-丁志明
口試委員-黃肇瑞
口試委員-張高碩
口試委員-蘇彥勳
口試委員-阮至正
中文關鍵字 高熵氧化物  太陽能選擇性吸收膜 
英文關鍵字 High entropy oxide  reactive magnetron sputter  solar selective coatings 
學科別分類
中文摘要 本研究利用反應式磁控濺鍍將高熵合金和高熵氧化物薄膜沉積於不鏽鋼基板上進行太陽能選擇性吸收膜之應用,在本實驗中,我們將探討不同參數對於薄膜所造成的影響,像是靶材功率、氧氣和氬氣比例以及沉積時間,沉積後的薄膜將進行空氣退火熱處理分析薄膜之熱穩定性以及退火前後變化,將著重於晶體結構、組成元素比例、厚度和光學性質的探討,使用的儀器像是X光繞射儀、場發射掃描式電子顯微鏡、橢圓偏光儀、UV-Vis-NIR分光光譜儀以及放射率計等,用於薄膜的性質探討以及用於太陽能選擇性吸收膜之表現。
英文摘要 High entropy alloy (HEA) and high entropy oxide (HEO) coatings were deposited using RF reactive magnetron co-sputtering techniques. Stainless steel (SS) was used as substrates for solar absorber coatings. In this works, various deposition parameters including sputtering power, O2 flow rate, and deposited time were investigated. The as-deposited coatings were post annealing at different temperatures in air to investigate its thermal stability. The resulting coatings therefore exhibit various compositions, crystal structures, grain sizes, and thicknesses. The obtained coatings were examined using, field emission scanning electron microscopes (FE-SEM), transmission electron microscopes (TEM), glazing angle X-Ray diffraction (GIXRD), Energy-dispersive X-ray spectroscopy (EDS), UV/vis/NIR spectrometer, emissionmeter, and ellipsometer. Effects of the material characteristics on the coating performance are discussed.
論文目次 摘要 II
英文摘要 III
誌謝 VIII
總目錄 IX
圖目錄 XII
表目錄 XV
第1章 緒論 1
1.1 背景 1
1.2 研究動機與目標 2
第2章 理論背景與文獻回顧 4
2.1 熱輻射與光學的吸收性質 4
2.1.1 熱輻射與黑體輻射 4
2.1.2 太陽光輻射光譜 6
2.1.3 光學吸收性質 8
2.2 太陽能吸收概要與原理 9
2.2.1 太陽能選擇性吸收模概要 9
2.2.2 太陽能吸收器 13
2.3 太陽能選擇性吸收膜種類與其文獻回顧 17
2.3.1 選擇性吸收膜種類 17
2.3.2 各類型選擇性吸收膜以及高溫環境使用狀況 18
2.4 材料之基本性質與文獻回顧 21
2.4.1 紅外光反射層 21
2.4.2 高熵材料之概念與高熵合金 21
2.4.3 高熵氧化物 22
2.5 物理氣象沉積之濺鍍及薄膜沉積機制 24
2.5.1 濺鍍機制 24
2.5.2 薄膜沉積機制 27
2.6 實驗重要性 29
第3章 研究方法與分析原理 31
3.1 實驗材料 31
3.2 實驗架構及流程圖 32
3.2.1 實驗流程 32
3.2.2 基板清洗與裁切 32
3.2.3 單層膜的製程參數 33
3.2.4 多層膜製程參數 36
3.3 材料分析與儀器設備 37
3.3.1 X光繞射儀 (X-ray Diffractometer, XRD) 37
3.3.2 場發射掃描式電子顯微鏡 (FE-SEM) 38
3.3.3 穿透式電子顯微鏡(TEM) 39
3.3.4 橢圓偏光儀 (Ellipsometer) 39
3.3.5 UV-vis-NIR分光光譜儀 (Spectrometer) 40
3.3.6 放射率計 (Emissionmeter) 41
第4章 結果與討論 42
4.1 單層紅外光反射之高熵合金 CrFeCoNiAl 42
4.2 中熵氧化物 44
4.2.1 鍍膜速率與微觀結構 44
4.2.2 結晶結構 46
4.2.3 光學性質 48
4.3 高熵氧化物(CrMnFeCoNi)O 49
4.3.1 鍍膜速率與微觀結構 49
4.3.2 結晶結構和元素比例 52
4.3.3 光學性質 57
4.4 高熵氧化物(CrFeCoNiAl)O 61
4.4.1 鍍膜速率和微觀結構 61
4.4.2 結晶結構 63
4.4.3 光學性質 64
4.5 多層膜太陽能選擇性吸收膜 66
4.5.1 折射率 66
4.5.2 高熵合金高溫(600°C)退火測試 67
4.5.3 A2c和A2f之比較 69
4.5.4 IR/A1d/A2f/A3b 退火測試 74
4.5.5 IR/A1d/A2f/A3b/AR 75
第5章 結論 77
第6章 參考文獻 78
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