進階搜尋


   電子論文尚未授權公開,紙本請查館藏目錄
(※如查詢不到或館藏狀況顯示「閉架不公開」,表示該本論文不在書庫,無法取用。)
系統識別號 U0026-2507201211404900
論文名稱(中文) 利用奈米球鏡微影術製造光子晶體結構
論文名稱(英文) Controlled Fabrication of Photonic-Crystal Structure Using Nanospherical-Lens Lithography
校院名稱 成功大學
系所名稱(中) 光電科學與工程學系
系所名稱(英) Department of Photonics
學年度 100
學期 2
出版年 101
研究生(中文) 黃俊森
研究生(英文) Chun-Sen Huang
學號 L76004111
學位類別 碩士
語文別 中文
論文頁數 88頁
口試委員 指導教授-張允崇
口試委員-羅光耀
口試委員-張世慧
中文關鍵字 奈米球鏡微影術  光子晶體  AEF法 
英文關鍵字 Nanospherical-LensLithography  Photonic-Crystal  alternative electric field (AEF) method 
學科別分類
中文摘要 本實驗室研究“奈米球鏡微影術”已有兩年的時間,這個方法可以快速製作出高品質的奈米圓盤陣列結構(光子晶體結構),並且其製作出的面積大、製造成本也低。這個技術仍有些缺點其中之一是奈米球陣列沒有辦法重複使用,另一點是其所製作的奈米圓盤陣列不能在我們預先選擇的區域製作。在本篇論文中,我們將研究幾種解決的方案,可重複使用的奈米球鏡光罩以及使奈米球鏡微影術能夠在預先選擇的區域製作奈米結構。
首先我們將採用一種叫做“alternative electric field (AEF) method”新方法排列納米球陣列,這是一種能夠將奈米球排列進特定圖形區域的方法。雖然我們利用AEF這個方法排出幾個圖形的奈米球陣列,但是品質太差,無法提供我們製作高品質的奈米結構。製作可重複性使用的奈米球光罩方面,我們利用石英當作基板鋪上silica球,經過熱退火處理後當作球光罩。但是因為silica球陣列和光阻之間的contact條件是一個很大的問題。之後我們發現PS球不僅能有更好的球陣列排列,其作為球透鏡聚焦紫外光的效果比silica球更好。最後我們使用PS球搭配一般光罩,能夠在預先選擇區域製作出奈米圓盤陣列。而可重複利用的奈米球光罩現在正在做更詳細的研究。
另外我們還發現因為光罩邊緣造成的繞射現象會使被光罩擋住的部份也曝光。經過仔細的研究這個現象,並且調整了一些參數,包括奈米球的直徑和墊片的厚度。我們能夠製造出一些有趣的光子晶體結構,我們相信這種現象能夠找到合適的工業應用,製造某些光電元件上。
英文摘要 Nanospherical-Lens Lithography (NLL), which has been developed in our laboratory for the last two years, is capable of fabricating high-quality nanodisk arrays(Photonic-Crystal Structure) very quickly. The fabricated nanodisk arrays cover large area and very low cost. One of the major disadvantages of NLL is that the nanosphere lens array is not reusable. The other is that the nanodisk arrays cannot be fabricated at a pre-selected location. In this dissertation, we will study several solutions to fabricate reusable Nanospherical-lens mask and to fabricate nanostructures at a pre-selected area.
We will first employ a new way to align nanosphere arrays, which is referred as “alternative electric field (AEF) method”. AEF method is capable of aligning nanospheres into a certain patterns. Several parameters, including temporal and spatial frequencies are studied. Although several patterned nanosphere arrays are obtained using AEF method, the quality is too low to fabricate high-quality nanostructures. To fabricate reusable nanosphere mask, annealed silica spheres on top of quartz substrates were used as the lithography mask. However, the contact condition between the silica sphere arrays and the photoresist is a major problem. We also discover that polystyrene nanospheres not only can form better nanosphere arrays but also work better as a ball lens for the incoming UV light. By using polystyrene nanospheres and a regular photolithography mask, we are able to fabricate nanodisk arrays at a pre-selected area. The reusability of the nanosphere mask is now under more detailed study.
In addition, we also discover that the diffraction effect caused by the photo-mask pattern is able to exposure the covered area. By carefully study this phenomenon by adjusting several parameters, including nanosphere diameters and spacer thickness. We are able to fabricate several interesting photonic crystal structures. We believe this phenomenon will find suitable industrial applications in fabricating certain photonic devices.
論文目次 中文摘要Ⅰ
英文摘要Ⅲ
致謝Ⅵ
本文目錄Ⅶ
圖表目錄ⅩⅠ
第一章 簡介I
1-1 研究動機1
1-2 奈米球的排列技術2
1-2.1早期的奈米球排列方式2
1-2.2 利用自組裝式排球2
1-2.3 控制交流電場排球方式3
1-3 奈米球鏡微影術6
1-3.1 奈米球微影術介紹6
1-3.2奈米球鏡微影術7
1-4 光子晶體11
1-4.1 何謂光子晶體11
1-4.2光子晶體應用於LED14
1-4.3光子晶體點缺陷與線缺陷16
1-5總結18
第二章 實驗儀器及實驗流程19
2-1 奈米球溶液19
2-2實驗室自組裝排球儀器架設20
2-3 實驗製程儀器22
2-3.1 光罩對準儀22
2-3.2真空熱蒸鍍機23
2-3-3 電漿蝕刻清潔系統24
2-4 量測儀器27
2-4.1 掃描式電子顯微鏡27
2-5 實驗流程與架構29
2-5.1 交流電場排列奈米球陣列29
2-5.2 奈米球鏡微影術(NLL)製造金屬圓盤陣列30
2-5.3 NLL搭配可重複利用之球形光罩31
2-5.4 NLL製造可選擇區域之光子晶體32
2-5.5 斜向蒸鍍金屬遮罩34
第三章 AEF排球與用可重複利用球光罩的NLL35
3-1 AEF排球35
3-1.1 AEF於無圖形基板排球35
3-1.2 時間頻率對於AEF排球的影響37
3-1.3 AEF在有光阻圖形的電極排球以及時間、空間頻率之影響38
3-1.3 AEF藉由溶液蒸發排球40
3-2 可重複利用之奈米球光罩43
3-2.1 silica球光罩43
3-2.2 silica球光罩在蝕刻高低差基板曝光45
3-2.3 silica球光罩與PS球光罩47
3-2.4 PS球光罩蝕刻高低差49
3-2.5 PS球光罩配合光罩曝光51
3-3 結論53
第四章 奈米球鏡微影術利用光罩在選擇性區域製作結構55
4-1 製作選擇性區域陣列結構55
4-1.1 各種不同形狀的陣列結構55
4-1.2 陣列邊緣的漸變現象57
4-2 結構邊緣漸變現象研究60
4-2.1 不同墊片厚度對漸變現象的影響60
4-2.2 不同球徑大小對漸變現象的影響62
4-2.3 金屬圓盤陣列的統計分析66
4-3 加入旋轉斜向蒸鍍控制曝光參數製造缺陷結構71
4-3.1旋轉斜向蒸鍍製程對漸變現象的影響71
4-3.2微米尺度光罩製造次微米結構(點缺陷)74
4-3.3微米尺度光罩製造次微米結構(線缺陷)78
4-4 結論82
第五章 結論與未來展望83
5-1結論83
6-2未來展望85
參考文獻86
參考文獻 [1] R. Micheletto, H. Fukuda, and M. Ohtsu, “A Simple Method for the Production of a Two-Dimensional Ordered Array of Small Latex Particles”, Langmuir.8, 3333-3336 (1995)

[2] K. H. Li and H. W. Choi, “Air-spaced GaN nanopillar photonic band gap structures patterned by nanosphere lithography”, JOURNAL OF APPLIED PHYSICS 109, 023107 (2011)

[3] N. D. Denkov, O. D. Velev, P. A. Kralchevsky, I. B. Ivanov, H.Yoshimura and K. Nagayama,“Mechanism of formation of two-dimensional crystals from latex particles on substrates”, Langmuir .8, 3183-3190 (1992)

[4] R. Xie and X.Y. Liu, “Electrically Directed On-Chip Reversible Patterning of Two-Dimensional Tunable Colloidal Structures”,Adv. Funct. Mater. 2008, 18, 802–809

[5] A. Mohammadkhani and K. Jiang, “Fabrication of Dual Patterned Nanocavities Using Double Layer Nanosphere Lithography”, 2011 11th IEEE International Conference on Nanotechnology Portland Marriott August 15-18, 2011, Portland, Oregon, USA

[6] Wei Wu, Dibyendu Dey, Omer G. Memis, Alex Katsnelson, Hooman Mohseni, “Fabrication of Large Area Periodic Nanostructures Using Nanosphere Photolithography”, Nanoscale Res Lett (2008) 3:351–354.

[7] Jong-Bin Yeo and Hyun-Yong Lee, “Realization of multi-paired photonic crystals by the multipleexposure nanosphere lithography process”, Scripta Materialia 66 (2012) 311–314.

[8] E. Yablonovitch, “Inhibited Spontaneous Emission in Solid-State Physics and Electronics”, Phys. Rev. Lett. 58, 2059 (1987).

[9] S. John, “Strong localization of photons in certain disordered dielectric superlattices”, Phys. Rev. Lett. 58, 2486 (1987).

[10] 欒丕綱,陳啟昌,“光子晶體---從蝴蝶翅膀到奈米光子學”,五南圖書出版社

[11] 張高德、欒丕綱,“光子晶體簡介”,光學工程 第九十五期95.09

[12] L. Brillouin, “Wave propagation in periodic structure”2nd, 1946, Mineola, New York.

[13] J. C. Knight, J. Broeng, T. A. Birks, and P. St. J.Russell, “Photonic band gapguidance in opticalfibers”, Sicience, 282, 1476 (1998)

[14] A. Mekis, J. C. Chen, I. Kurland, S. Fan, P. R. Villeneuve, and J.D. Joannopoulos, “High Transmission through Sharp Bends in Photonic Crystal Waveguides” ,Phys. Rev. Lett. 77, 3787 (1996).

[15] A. A. Erchak, D. J. Ripin, Sh. Fan, P.Rakich, J. D. Joannopoulos, E. P. Ippen, G. S. Petrich and L. A. Kolodziejski, “Enhanced coupling to vertical radiation using a two-dimensional photonic crystal in a semiconductor light-emitting diode”, Appl. Phys. Lett. 78, 563 (2001)

[16] Attila Mekis, J. C. Chen, I. Kurland, Shanhui Fan, Pierre R. Villeneuve, and J. D. Joannopoulos ,“High Transmission through Sharp Bends in Photonic Crystal Waveguides”,Phys. Rev. Lett. 77, 3787–3790 (1996)

[17]曾重賓,氧電漿輔助奈米球微影術之研究與應用,碩士論文,國立成功大學(2010)

[18]儀器分析講義,SEM講義,元智大學
論文全文使用權限
  • 同意授權校內瀏覽/列印電子全文服務,於2017-08-14起公開。


  • 如您有疑問,請聯絡圖書館
    聯絡電話:(06)2757575#65773
    聯絡E-mail:etds@email.ncku.edu.tw