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系統識別號 U0026-1301201121020300
論文名稱(中文) 應用於磁化電漿量測中微波反射計之研發
論文名稱(英文) Development of Microwave Reflectometry System for Magnetized plasma Diagnostics
校院名稱 成功大學
系所名稱(中) 太空天文與電漿科學研究所
系所名稱(英) Assistant, Institute of Space, Astrophysical and Plasma Sciences(ISAPS)
學年度 99
學期 1
出版年 100
研究生(中文) 王振宇
研究生(英文) Cheng-Yu Wang
電子信箱 chengyu2001@msn.com
學號 LA697107
學位類別 碩士
語文別 英文
論文頁數 55頁
口試委員 指導教授-陳秋榮
口試委員-張嘉展
口試委員-河森榮一郎
口試委員-間瀨淳
中文關鍵字 電漿  微波  反射計 
英文關鍵字 plasma  microwave  reflectometry 
學科別分類
中文摘要 本篇論文在研究微波反射計(Microwave reflectometry)系統的研發以及量測磁化電漿(magnetized plasma)參數的應用。量測電漿密度以及電漿密度擾動是很重要的,透過高頻電磁波在電漿中傳遞的理論可以知道,藉由電磁波從截止點(Cutoff point)反射造成的相位變化可以決定這些參數。首先我們對微波反射計系統進行測試以驗證其功能,然後進行電漿實驗以量測電漿密度擾動。最後我們討論此反射計系統需要改進的地方。
英文摘要 This thesis develops a reflectometry system for diagnostics of plasma density profile and fluctuations in magnetized plasmas. Measuring the plasma density profile and fluctuations are important for studying magnetized plasmas. By using the theory of high frequency wave propagation in magnetized plasmas, the phase shift caused by EM wave reflection from the plasma cutoff layer can be measured to determine the plasma density profile and fluctuations. We first describe the results of the system test. Then, we apply the system to measure plasma density in the magnetic mirror device at the Plasma and Space Science Center (PSSC) of the National Cheng Kung University (NCKU). Presently, the system can measure only density fluctuations because the probe wave has a fixed frequency. Finally, we describe the necessary improvements of the reflectometry system in the future.
論文目次 致謝2
摘要 3
Abstract 4
List of figures 7
Chapter 1 Introduction 10
1.1 Overview of Fusion Research 10
1.2 Microwave diagnostics 12
1.2.1 Interferometry 13
1.2.2 Reflectrometry 13
1.2.3 Electron cyclotron emission 15
1.3 MPX device in NCKU plasma laboratory 15
1.4 Thesis outline 18
Chapter 2 Theory of high frequency wave propagation in nonuniform magnetized plasmas 19
2.1 EM waves in magnetized plasmas 19
2.2 Propagation of Ordinary (O) and Extraordinary (X) modes 22
Chapter 3 Design of Reflectometry System28
3.1 Refelctometry setup 28
3.2 System test 36
Chapter 4 Measurement of plasma fluctuations in the magnetic mirror device 41
4.1 Plasma parameters of the magnetic mirror device 41
4.2 Measurement of density fluctuation in MPX plasma 42
Chapter 5 Summary and conclusions 49
5.1 Summary of the present work 49
5.2 recommendations for future work 49
5.2.1 Density profile measurement 49
5.2.2 Techniques of IF stabilization. 52
5.2.3 Antenna consideration 53
Reference 55
參考文獻 [1] I. H. Hutchinson, Principles of Plasma Diagnostics, 2nd. Cambridge University (2002)
[2] Hartfuss, H. J. T. Geist, et al. “Heterodyne methods in millimeter wave plasma diagnostics with applications to ECE, interferometry and reflectometry” Plasma Physics and Controlled Fusion 39(11): 1693-1769( 1997.)
[3] Francis F. Chen, Introduction to Plasma Physics and Controlled Fusion, Plenum Press, New York (1974)
[4] Mase A, Tokuzawa T, Bruskin L ,Kogi Y,Kubota S,Oyama N ”Density Profile and Fluctuation Measurement Using Microwave Reflectometry” Plasma and Fusion Research 1189-1200 (1998)
[5] Mase A, Yokota Y, et al., 2006 Rev. Sci. Instrum. 77 10E916
[6] Yokota Y, Mase A, Kogi Y, Tokuzawa T, and Kawahata K. 2008 Rev. Sci. Instrum. 79 056106
[7] N. Bretz, Phys. Fluids B4,2414(1992)。
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