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系統識別號 U0026-1202201515350300
論文名稱(中文) 以質點網格法模擬電容耦合電漿在具有庫倫碰撞及二次電子發射下之行為
論文名稱(英文) Particle-in-Cell Simulation of Capacitively Coupled Plasma in The Presence of Coulomb Collisions and Secondary Electron Emission
校院名稱 成功大學
系所名稱(中) 太空與電漿科學研究所
系所名稱(英) Institute of Space and Plasma Sciences
學年度 103
學期 1
出版年 104
研究生(中文) 陳彥樵
研究生(英文) Yan-Chiao Chen
學號 LA6011069
學位類別 碩士
語文別 英文
論文頁數 44頁
口試委員 指導教授-西村泰太郎
口試委員-談永頤
口試委員-西田靖
中文關鍵字 質點網格法  電容耦合電漿  庫倫碰撞  交流電場 
英文關鍵字 Particle-in-Cell  capacitively coupled plasma  Coulomb collision  RF bias 
學科別分類
中文摘要 以質點網格法建構電漿在一維有限空間中的模型,研究電容耦合電漿中的二次電子效應。此模型可模擬電子在一維空間中的行為。首先,我們可在系統的粒子密度、電位及電場分布中,觀察到“電漿鞘”的現象。進一步,我們考慮由電子撞擊器壁產生的二次電子。“電漿鞘”的形成,與二次電子的行為極為相關。為了使二次電子效應更加貼近實際狀況,在模擬中我們同時考慮了粒子間的庫倫碰撞。電容耦合電漿被廣泛地利用在工業上的電漿製程中。因此,我們在模擬系統中加入交流電場,並且藉由粒子軌跡及系統能量的發展探究交流電場(造成粒子共振)的效應。
英文摘要 A Particle-in-Cell method is built in one-dimensional electrostatic model to study effects of secondary electron emission (SEE) in capacitively coupled plasma (CCP). The model simulate the particles’ behavior in one-dimensional space bounded by two walls. The generation of “plasma sheath” is observed. Furthermore, secondary electron emission is incorporated which is produced by electrons’ bombardment. The formation of plasma sheath is closely related to the behavior of secondary electrons. To deal the SEE effect more realistically, the particles’ Coulomb collision effect is included into the simulation. We also employ radio-frequency (RF) electric field into the system as in CCP widely used in industrial processes. By following particles’ trajectories and energy development, effects of RF bias (which can then give rise to resonance between the bounce motion of particles) is examined.
論文目次 摘要 I
Abstract II
Chapter 1 Introduction 1
Chapter 2 Computational Model 3
2.1 One-Dimensional Electrostatic Model 3
2.2 Plasma Sheath 5
2.2.1 Concept of Plasma Sheath 5
2.2.2 Sheath Equation 6
2.3 Secondary Electron Emission 10
2.4 Coulomb Collision Model 11
2.5 Radio-Frequency (RF) Heating Plasma 15
Chapter 3 Particle-in-Cell Simulation 17
3.1 Principle and Process 17
3.2 Setting the Position and Velocity Domain 19
3.3 Particles’ Loading 20
3.4 Time Advancing Particle Position 22
3.4.1 Self-Consistent Particle Push 22
3.4.2 Particle Position Change Due to Secondary Electron Emission 23
3.5 Gathering Particles Density 24
3.6 Solving Poisson Equation 26
3.7 Self-Consistent Electric Field 27
3.8 Push Particle Velocity 28
3.8.1 Particles Velocity Change Due to Self-Consistent Electric Force 28
3.8.2 Particles Velocity Change Due to Coulomb Collisions 29
3.8.3 Particles Velocity Change Due to Radio-Frequency (RF) Electric field 30
Chapter 4 Simulation Results 31
4.1 Classic Sheath Formation 31
4.2 Sheath Behavior with Secondary Electron Emission 33
4.3 Particles’ Behavior in Collison Model 35
4.4 Plasma Heating with External Electric Field 36
Chapter 5 Summary and Future Work 41
Reference 43
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[13] C.W.Huang, Y.C.Chen, and Y.Nishimura , “Particle-in-Cell simulation of plasma sheath dynamics with kinetic ions” IEEE Transactions on Plasma Science 42, 2014
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